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Technology Information

Title	METHOD FOR THE USE OF NANOPARTICLES TO ENHANCE THE DIELECTRIC CONSTANT OF INSULATORS AND APPLICATIONS THEREOF
Case Number	06UMC082
Manager	Wayne McDaniel ( mcdanielwc@missouri.edu )
Abstract	This invention details the use of nanoparticles embedded within a dielectric film to greatly enhance the dielectric constant of this film. The dielectrics into which the nanoparticles are incorporated, and the deposition techniques are standard in the semiconductor industry. An increase in the dielectric constant of several orders of magnitude was achieved by embedding the nanoparticles. Several fundamental semiconductor devices can have important characteristics such as size, speed, and power consumption greatly improved with the use of these improved dielectric films. POTENTIAL AREAS OF APPLICATIONS: Semiconductor devices; CMOS devices, DRAM, flash memory. MAIN ADVANTAGES OF INVENTION: Several orders of magnitude increase in the dielectric constant; Uses currently available semiconductor technology, but dramatically improves; Semiconductor devices can be made that are smaller, faster, and use less power. STATE OF DEVELOPMENT: Demonstrated and tested in a laboratory setting. FURTHER R&D REQUIRED: Need to further optimize the design for commercialization.
Taxonomy	Technology Categories/Nanoparticles/Micro & Nanotech
Keywords	UM-Columbia, CMOS, metal, semiconductor, nanoparticle, DRAM, device, Complementary, oxide, flash, memory

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